The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2010
Filed:
Jul. 23, 2008
Susie Xiuru Yang, Sunnyvale, CA (US);
Susie Xiuru Yang, Sunnyvale, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method of determining a thickness of a residue layer on a substrate includes: (1) taking a first set of optical scatterometry measurements on the substrate after an etching procedure; (2) taking a second set of optical scatterometry measurements on the substrate after a post-etch cleaning procedure; (3) calculating a difference measurement between the first set and second set of optical scatterometry measurements; (4) determining an initial thickness measurement of the residue layer based on the difference measurement by applying a first dispersion model; and (5) adjusting the initial thickness measurement by applying a second dispersion model based on a material composition of the residue layer. Numerous other aspects are provided.