This inventor holds 2 USPTO granted patents and 3 published patent applications. Top assignee: Carl Zeiss Smt Gmbh. Active years: 2017-2024.
Company Filing History:
Years Active: 2017-2024
Title: Susanne Toepfer: Innovator in Optical Systems
Introduction
Susanne Toepfer is a prominent inventor based in Munich, Germany. She has made significant contributions to the field of optical systems, particularly in semiconductor lithography. With a total of 2 patents, her work has advanced the technology used in imaging devices.
Latest Patents
Her latest patents include a "Method and device for correcting a telecentricity error of an imaging device." This invention relates to a method for correcting telecentricity errors in imaging devices used for semiconductor lithography. It involves an illumination unit, an imaging optical unit, and a filter designed to correct these errors. Another notable patent is the "Method for ascertaining distortion properties of an optical system in a measurement system for microlithography." This method provides a systematic approach to measuring field-dependent image aberrations and determining distortion patterns in optical systems.
Career Highlights
Susanne Toepfer is currently employed at Carl Zeiss SMT GmbH, a leading company in the field of optical systems. Her work at this esteemed organization has allowed her to push the boundaries of technology in semiconductor lithography.
Collaborations
Throughout her career, Susanne has collaborated with notable colleagues such as Jochen Hetzler and Dirk Seidel. These collaborations have further enriched her contributions to the field.
Conclusion
Susanne Toepfer's innovative work in optical systems and her patents reflect her expertise and dedication to advancing technology in semiconductor lithography. Her contributions continue to influence the industry and inspire future innovations.