Susan M Holl

Title: Susan M Holl: Innovator in Polymer Technology

Introduction

Susan M Holl is a prominent inventor based in San Jose, CA (US). She has made significant contributions to the field of polymer technology, holding a total of 3 patents. Her work focuses on optimizing the properties of polymer pellicles and enhancing their performance in lithography applications.

Latest Patents

One of her latest patents is titled "Process to optimize properties of polymer pellicles and resist for lithography applications." This patent discloses pellicle compositions and methods for creating such compositions, which include highly fluorinated polymers and fluorinated polymer/PVDF co-polymers. Another notable patent is "Fullerenes to increase radiation resistance in polymer-based pellicles." This invention involves a pellicle made of polymer material that contains fullerenes, which help reduce the damaging effects of radiation during exposure operations. The fullerenes may include nanotubes and/or buckyballs, with the buckyballs potentially enclosing gas molecules that further mitigate radiation damage.

Career Highlights

Susan M Holl is currently employed at Intel Corporation, where she continues to innovate and develop advanced polymer technologies. Her expertise in this area has positioned her as a key contributor to the company's research and development efforts.

Collaborations

Some of her notable coworkers include Alexander Tregub and Tim T Chen, who collaborate with her on various projects within the field of polymer technology.

Conclusion

Susan M Holl's contributions to polymer technology and her innovative patents demonstrate her significant impact in the field. Her work continues to advance the capabilities of polymer pellicles, making her a valuable asset to Intel Corporation and the broader scientific community.