The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2007
Filed:
Sep. 13, 2005
Applicants:
Alexander Tregub, Oak Park, CA (US);
Tim T. Chen, Phoenix, AZ (US);
Susan Holl, San Jose, CA (US);
Inventors:
Assignee:
Intel Corporation, Santa Clara, CA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A pellicle made of a polymer material contains fullerenes within the polymer material to reduce the damaging effects of radiation that is transmitted through the pellicle during an exposure operation. The fullerenes may comprise nanotubes and/or buckyballs. The buckyballs may also enclose molecules of a gas that further reduce the damaging effects of the radiation on the polymer material.