Company Filing History:
Years Active: 2002-2004
Title: Innovations of Susan L Brandow
Introduction
Susan L Brandow is a notable inventor based in Springdale, MD (US). She has made significant contributions to the field of beam lithography and mask fabrication. With a total of 3 patents, her work has advanced the technology used in electronic devices.
Latest Patents
One of her latest patents is titled "Anti-charging layer for beam lithography and mask fabrication." This invention discloses an anti-charging layer that reduces beam displacement and increases pattern placement accuracy. The process is utilized in the fabrication of high-resolution lithographic masks and in beam direct write lithography for electronic devices. The anti-charging layer is formed using metal films bound to metal ligating self-assembled monolayers (SAMs) as discharge layers.
Career Highlights
Susan works for the USA as represented by the Secretary of the Navy. Her role in this organization has allowed her to contribute to important advancements in technology and innovation.
Collaborations
Some of her notable coworkers include Elizabeth Ann Dobisz and Walter J Dressick. Their collaboration has further enhanced the impact of her inventions.
Conclusion
Susan L Brandow's innovative work in beam lithography and mask fabrication showcases her expertise and dedication to advancing technology. Her contributions are significant in the field and continue to influence the development of electronic devices.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.