Company Filing History:
Years Active: 2000-2004
Title: Innovations by Susan Ellingboe in Plasma Processing Technology
Introduction
Susan Ellingboe is a prominent inventor based in Fremont, CA, known for her contributions to plasma processing technology. With a total of 4 patents, she has made significant advancements in the field, particularly in techniques for etching low capacitance dielectric layers.
Latest Patents
One of her latest patents is titled "Technique for etching a low capacitance dielectric layer." This patent discloses methods for etching through a low capacitance dielectric layer in a plasma processing chamber. The techniques utilize an etch chemistry that includes nitrogen, oxygen, and a hydrocarbon. By employing a plasma created from this etch chemistry, fast etch rates can be achieved while maintaining profile control and preserving the critical dimensions of the resultant openings, such as vias or trenches, in the low capacitance layer.
Another notable patent is "Convertible hot edge ring to improve low-K dielectric etch." This innovation further enhances the etching process, contributing to the efficiency and effectiveness of plasma processing.
Career Highlights
Susan Ellingboe is currently associated with Lam Research Corporation, a leading company in the semiconductor equipment industry. Her work at Lam Research has positioned her as a key player in the development of advanced etching techniques.
Collaborations
Throughout her career, Susan has collaborated with talented individuals such as Ian J. Morey and Janet M. Flanner. These collaborations have fostered innovation and have been instrumental in her research and development efforts.
Conclusion
Susan Ellingboe's contributions to plasma processing technology through her patents and work at Lam Research Corporation highlight her role as a significant inventor in the field. Her innovations continue to impact the semiconductor industry positively.