Company Filing History:
Years Active: 2015
Title: Innovator Spotlight: Suresh Ramakrishnan
Introduction
Suresh Ramakrishnan is an accomplished inventor based in Boise, ID, who has made significant contributions to the field of semiconductor device structures. His innovative approach has led to the development of a novel method that enhances the efficiency and effectiveness of semiconductor manufacturing processes.
Latest Patents
Suresh holds a patent titled "Method of forming a planar surface for a semiconductor device structure, and related methods of forming a semiconductor device structure." This patent describes a method for creating a planar surface by forming a particle film consisting of discrete particles on a non-planar surface of a semiconductor device. Following this, the semiconductor structure undergoes a chemical-mechanical polishing process, which is crucial for refining the device quality. This advances the fabrication techniques within the semiconductor industry and contributes to more reliable electronic devices.
Career Highlights
Suresh is currently employed at Micron Technology Incorporated, a leading company in semiconductor manufacturing. His expertise in the field has not only resulted in a patent but also emphasizes his role in enhancing semiconductor device technology. His work is integral to the ongoing innovation efforts at the company.
Collaborations
Throughout his career, Suresh has collaborated with talented professionals, including Andrew Dennis Watson Carswell and Wayne Hai-Wei Huang. These partnerships have fostered an environment of innovation and creativity, ultimately pushing the boundaries of what is possible within semiconductor technology.
Conclusion
Suresh Ramakrishnan's contributions to the semiconductor industry are marked by his innovative patent and his role at Micron Technology Incorporated. His work underscores the importance of developing advanced manufacturing methods that lead to better-performing semiconductor devices. As he continues to collaborate with other experts in the field, he remains poised to make further advancements that could benefit the technological landscape significantly.