This inventor holds 1 USPTO granted patent. Top assignee: Kla Instruments Corporation. Active years: 1996.
Company Filing History:
Years Active: 1996
Title: Surendra Lele: Innovator in Electron Beam Inspection Systems
Introduction
Surendra Lele is a notable inventor based in Santa Clara, CA, who has made significant contributions to the field of particle scanning systems. His innovative work focuses on enhancing inspection methods for substrates using advanced technology.
Latest Patents
Surendra Lele holds a patent for an "Electron Beam Inspection System and Method." This invention encompasses various embodiments of a method and apparatus designed for a particle scanning system and an automatic inspection system. The system directs a particle beam at the surface of a substrate for scanning purposes. It includes a selection of detectors to identify secondary particles, back-scattered particles, and transmitted particles from the substrate. The substrate is mounted on an x-y stage, allowing it to have at least one degree of freedom during scanning. Additionally, the substrate is subjected to an electric field to accelerate secondary particles. The system is equipped with capabilities to accurately measure the substrate's position concerning the charged particle beam. An optical alignment mechanism is also included for initial alignment beneath the particle beam. Furthermore, a vacuum means is utilized for evacuating and repressurizing the chamber containing the substrate, enhancing the efficiency of the inspection process.
Career Highlights
Surendra Lele is associated with Kla Instruments Corporation, where he applies his expertise in developing cutting-edge inspection technologies. His work has been instrumental in advancing the capabilities of electron beam inspection systems.
Collaborations
Some of his notable coworkers include John McMurtry and Chun C Lin, who have collaborated with him on various projects within the company.
Conclusion
Surendra Lele's contributions to the field of electron beam inspection systems highlight his innovative spirit and dedication to advancing technology. His patent reflects a significant step forward in the efficiency and accuracy of substrate inspection methods.