Suraj Rengarajan

Title: Suraj Rengarajan: Innovator in Silicon-Based Dielectric Films

Introduction

Suraj Rengarajan is a notable inventor based in Bengaluru, India. He has made significant contributions to the field of materials science, particularly in the development of silicon-based dielectric films. His innovative approach has led to advancements in processing methods that are crucial for various applications in technology.

Latest Patents

Suraj holds a patent for a method titled "Deposition of silicon-based dielectric films." This processing method involves positioning a substrate in a processing chamber and setting the substrate temperature between 50° C. and 500° C. The method includes conducting an atomic layer deposition (ALD) cycle on the substrate, which is repeated to form a silicon oxide film. The ALD cycle consists of exposing the substrate to an aminosilane precursor, purging the chamber, exposing the substrate to an oxidizing agent, and purging the chamber again.

Career Highlights

Suraj Rengarajan is currently employed at Applied Materials, Inc., a leading company in the field of materials engineering. His work focuses on enhancing the efficiency and effectiveness of deposition processes, which are vital for semiconductor manufacturing and other high-tech applications.

Collaborations

Suraj collaborates with talented professionals in his field, including Geetika Bajaj and Prerna Sonthalia Goradia. Their teamwork fosters innovation and drives advancements in their projects.

Conclusion

Suraj Rengarajan's contributions to the field of silicon-based dielectric films exemplify the impact of innovative thinking in technology. His patent and ongoing work at Applied Materials, Inc. highlight his role as a key player in advancing materials science.