Sunwook Jung

Title: Sunwook Jung: Innovator in Photomask Technology

Introduction

Sunwook Jung is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of photomask technology, particularly through his innovative methods for etching correction values.

Latest Patents

Sunwook Jung holds a patent for a "Method of deriving etching correction values for patterns of photomask and method of fabricating photomask." This patent describes a method that includes several steps. The layout data of the photomask are provided, and local etching correction values of respective patterns are determined from the pattern configurations at respective areas of the photomask. A global etching correction value is determined from a wafer coverage ratio calculated mainly from the layout data. The local etching correction values of the respective patterns are added with the global etching correction value to obtain total etching correction values of the respective patterns. In the method of fabricating a photomask, the layout data are subjected to an etching correction based on the total etching correction values of the respective patterns and then to an optical proximity correction, and the photomask patterns are formed based on the resulting layout data.

Career Highlights

Sunwook Jung is currently employed at Macronix International Co., Ltd., where he continues to advance his research and development in photomask technology. His work has been instrumental in improving the accuracy and efficiency of photomask fabrication processes.

Collaborations

Sunwook Jung collaborates with Chao-Lung Lo, contributing to the innovative projects at Macronix International Co., Ltd. Their teamwork enhances the development of cutting-edge technologies in the semiconductor industry.

Conclusion

Sunwook Jung is a prominent figure in the field of photomask technology, with a focus on etching correction methods. His contributions are vital for advancements in semiconductor manufacturing processes.