Mumbai, India

Sunil D Deval

This inventor holds 2 USPTO granted patents. Top assignee: Clariant Corporation. Active years: 2005-2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sunil D Deval. Retrieved from https://idiyas.com/inventor/sunil-d-deval

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2005-2006

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2 patents (USPTO):Explore Patents

Title: Sunil D Deval: Innovator in Pigment Chemistry

Introduction

Sunil D Deval is a prominent inventor based in Mumbai, India. He has made significant contributions to the field of pigment chemistry, holding 2 patents that showcase his innovative approach to developing novel compounds.

Latest Patents

His latest patents include the invention of pigmented 1-naphtholsulphonic acid-based monoazo pigments. This invention relates to novel monoazo compounds characterized by high intensity and light-fastness. Another notable patent involves laked monoazo pigments based on naphtholsulfonic acids, which are recognized for their high drying power and light-fastness.

Career Highlights

Sunil D Deval is currently associated with Clariant Corporation, where he continues to advance his research and development efforts in pigment technology. His work has been instrumental in enhancing the quality and performance of pigments used in various applications.

Collaborations

Throughout his career, Sunil has collaborated with notable professionals in the field, including Hans Joachim Metz and Uday T Nabar. These collaborations have further enriched his research and contributed to the success of his inventions.

Conclusion

Sunil D Deval's innovative contributions to pigment chemistry highlight his expertise and dedication to advancing the field. His patents reflect a commitment to developing high-performance compounds that meet industry needs.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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