Sungwook Hwang

Title: Sungwook Hwang: Semiconductor Innovation and Patent Contributions.

Introduction

Sungwook Hwang is an inventor based in Suwon, South Korea, and works at Samsung Electronics Ltd. His work includes semiconductor yield prediction and defect detection, addressing challenges in manufacturing quality and process monitoring. He is associated with 3 patents.

Latest Patents

Hwang’s listed recent patents focus on analyzing semiconductor data and measuring patterns on semiconductor samples.

Semiconductor Yield Prediction Method and Apparatus. This invention describes a method for predicting semiconductor yield using wafer-level data. It generates virtual chips corresponding to wafers, maps wafer test results to those virtual chips, and calculates defect rates. The method then uses the defect rate to determine an equipment defect index.

Defect Detecting Device and Method. This invention describes a test device with memory and a controller. The memory stores reference data, including an image of a reference pattern, its height and shadow length, and a value representing the correlation between those measurements. The controller analyzes an image of a pattern on another semiconductor sample, measures its shadow length, and estimates its height using the stored reference data.

Career Highlights

At Samsung Electronics Ltd., Hwang’s patent work addresses semiconductor manufacturing and inspection. His described inventions apply data analysis and image-based measurement to support yield prediction and defect detection.

Collaborations

Hwang’s listed coworkers include Seulgi Ok and Kibum Lee. Their inclusion reflects professional connections within the semiconductor innovation community.

Conclusion

Sungwook Hwang’s patent contributions focus on practical methods for predicting semiconductor yield and detecting defects, supporting more informed manufacturing and inspection processes.