The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 07, 2026

Filed:

May. 09, 2023
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Sungwook Hwang, Suwon-si, KR;

Tae Soo Shin, Suwon-si, KR;

Seulgi Ok, Suwon-si, KR;

Kibum Lee, Suwon-si, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 23/2251 (2018.01); G06T 7/00 (2017.01); G06T 7/70 (2017.01);
U.S. Cl.
CPC ...
G06T 7/001 (2013.01); G01N 23/2251 (2013.01); G06T 7/70 (2017.01); G01N 2223/418 (2013.01); G01N 2223/6116 (2013.01); G06T 2207/10061 (2013.01); G06T 2207/20084 (2013.01); G06T 2207/20132 (2013.01); G06T 2207/30148 (2013.01);
Abstract

A defect detection device includes: a memory configured to store a layout image indicating a circuit pattern and indicating a dummy pattern; and a controller comprising an artificial neural network configured to learn the layout image, the controller being configured to: determine, based on an inspection image obtained by photographing an area including a defect on a wafer, whether the defect is in a first area in which the circuit pattern is positioned or in a second area in which the dummy pattern is positioned, by using the artificial neural network, and determine a type of the defect based on whether the defect is positioned is in the first area or in the second area.


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