Sungwon Kwon

Title: Innovations of Sungwon Kwon

Introduction

Sungwon Kwon is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of photomasks and lithography processes. With a total of 4 patents to his name, Kwon continues to push the boundaries of technology.

Latest Patents

One of his latest patents involves a photomask that comprises a substrate, a reflective layer, and an absorption structure. This absorption structure includes patterns that are spaced apart on the reflective layer, with dummy holes designed to exhaust hydrogen. Additionally, the photomask may feature a barrier layer to reduce hydrogen entry. Another significant patent focuses on a pellicle for extreme ultraviolet (EUV) lithography. This pellicle is designed to mitigate thermal accumulation in its membrane, featuring a thermal buffer layer with higher emissivity than the membrane itself. The thermal buffer layer may also contain a greater carbon content, enhancing its performance.

Career Highlights

Sungwon Kwon is currently employed at Samsung Electronics Co., Ltd., where he applies his expertise in developing advanced photomask technologies. His work has been instrumental in improving the efficiency and effectiveness of lithography processes.

Collaborations

Kwon collaborates with talented coworkers such as Yongseok Jung and Hwanchul Jeon, contributing to innovative projects within the company.

Conclusion

Sungwon Kwon's contributions to the field of photomasks and lithography are noteworthy. His innovative patents and collaborations at Samsung Electronics Co., Ltd. highlight his role as a leading inventor in the industry.