Sungman Whang

Title: Innovations of Sungman Whang in Semiconductor Technology

Introduction

Sungman Whang is a notable inventor based in Yongin-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his innovative approach to integrated circuit devices.

Latest Patents

Whang's latest patents include a "Semiconductor integrated circuit device and manufacturing method thereof." This invention features a semiconductor integrated circuit device that comprises a substrate with distinct P-type and N-type element regions. It includes a channel active region with multiple channels and gate lines, along with a gate insulating film and source/drain regions. Another patent is for "Semiconductor devices having a fin-shaped active region and methods of manufacturing the same." This method involves creating an active pattern that protrudes from the substrate and forming a sacrificial gate structure, which enhances the performance of semiconductor devices.

Career Highlights

Sungman Whang is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work focuses on advancing semiconductor technologies, which are crucial for modern electronic devices.

Collaborations

Whang collaborates with talented coworkers, including Changwoo Noh and Munhyeon Kim, who contribute to the innovative projects at Samsung Electronics.

Conclusion

Sungman Whang's contributions to semiconductor technology through his patents reflect his expertise and commitment to innovation. His work continues to influence the development of advanced electronic devices.