Daejeon, South Korea

Sungkwan Je

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Electronics and Telecommunications Research Institute. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sungkwan Je. Retrieved from https://idiyas.com/inventor/sungkwan-je

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Innovations by Sungkwan Je

Introduction

Sungkwan Je is a notable inventor based in Daejeon, South Korea. He has made significant contributions to the field of image processing through his innovative methods and technologies. His work is particularly focused on enhancing the capabilities of computing devices in extracting image features.

Latest Patents

Sungkwan Je holds a patent for a "Method and apparatus for extracting image feature." This patent describes a method for extracting features from an image for use in a computing device. The process involves producing Gaussian Scale Space (GSS) images in the form of a pyramid from the input image. It also includes performing Scale Normalized Laplacian Filtering on the GSS images, detecting interest points from the images, and extracting features using these detected interest points. He has 1 patent to his name.

Career Highlights

Sungkwan Je is associated with the Electronics and Telecommunications Research Institute, where he continues to push the boundaries of technology. His work has been instrumental in advancing image processing techniques, which are crucial for various applications in computing.

Collaborations

Some of his notable coworkers include Seungjae Lee and Sangil Na, who collaborate with him on various projects within the institute.

Conclusion

Sungkwan Je's innovative approach to image feature extraction showcases his expertise and dedication to advancing technology. His contributions are valuable to the field and continue to inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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