This inventor holds 2 USPTO granted patents and 5 published patent applications. Top assignee: Zeus. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Innovations of Sung Won Mo: A Pioneer in Etching Technology
Introduction: Sung Won Mo is an accomplished inventor based in Hwaseong, South Korea. He has made significant contributions to the field of etching technology, particularly with his innovative designs and methods. His work has garnered attention for its practical applications in various industries.
Latest Patents: Sung Won Mo holds a patent for an "Etching device and etching method thereof." This invention relates to an etching device that includes an etchant supply unit for delivering an etchant to an etching chamber, a rinsing liquid supply unit for providing a rinsing liquid, and a cleaning liquid supply unit for supplying a cleaning liquid. Additionally, it features a first pressurization maintaining unit that ensures at least one of the etching chamber and the etchant supply unit operates in a pressurized atmosphere. This patent showcases his innovative approach to enhancing etching processes.
Career Highlights: Sung Won Mo is currently employed at Zeus, where he continues to develop cutting-edge technologies. His work at the company has positioned him as a key player in advancing etching methods and devices. With a total of 1 patent, he has demonstrated his ability to innovate and contribute to the field.
Collaborations: Sung Won Mo has collaborated with notable colleagues, including Seong Hwan Park and Seung Hoon Lee. Their teamwork has fostered an environment of creativity and innovation, leading to advancements in their respective fields.
Conclusion: Sung Won Mo's contributions to etching technology exemplify the spirit of innovation. His patent and ongoing work at Zeus highlight his commitment to advancing the industry. His collaborations further enhance the potential for future breakthroughs in etching methods.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile