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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12666901 B1

PDFFull Text
Date of Patent:
Jun. 23, 2026

Filed:

Sep. 05, 2024

Etching device and etching method thereof

Applicant:

Zeus Co., Ltd., Hwaseong-si, KR;

Inventors:

Seung Hoon Lee, Hwaseong-si, KR;

Sung Won Mo, Hwaseong-si, KR;

Yang Ho Lee, Osan-si, KR;

Jeong Hyun Bae, Hwaseong-si, KR;

Seong Hwan Park, Cheongju-si, KR;

Hyun Dong Cho, Sejong-si, KR;

Assignee:

ZEUS CO., LTD., Hwaseong-si, KR;

Attorney:

KILE PARK REED & HOUTTEMAN PLLC

Primary Examiner:

Jeffrie R Lund

Int. Cl.
CPC ...
H10P 72/00 (2026.01); B08B 3/04 (2006.01); C09K 13/04 (2006.01); H10P 50/00 (2026.01); H10P 50/28 (2026.01); H10P 72/10 (2026.01); H10P 72/30 (2026.01);
U.S. Cl.
CPC ...
H10P 72/0418 (2026.01); B08B 3/04 (2013.01); C09K 13/04 (2013.01); H10P 50/00 (2026.01); H10P 50/283 (2026.01); H10P 72/0406 (2026.01); H10P 72/0411 (2026.01); H10P 72/0422 (2026.01); H10P 72/0424 (2026.01); H10P 72/0426 (2026.01); H10P 72/1914 (2026.01); H10P 72/33 (2026.01);
Abstract

The present invention relates to an etching device and an etching method thereof, the etching device comprising: an etchant supply unit for supplying an etchant to an etching chamber, a rinsing liquid supply unit for supplying a rinsing liquid to the etching chamber; a cleaning liquid supply unit for supplying a cleaning liquid to the etching chamber; and a first pressurization maintaining unit for maintaining at least one of the etching chamber and the etchant supply unit in a pressurized atmosphere.

Find Patent Forward Citations

Lee, Seung. (2026). Etching device and etching method thereof (U.S. Patent No. 12666901). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12666901

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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