Seoul, South Korea

Sung Won David Roh

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Lg Innotek Co., Ltd.. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sung Won David Roh. Retrieved from https://idiyas.com/inventor/sung-won-david-roh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

 

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Innovations of Sung Won David Roh

Introduction

Sung Won David Roh is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of light-emitting devices, showcasing his expertise through his innovative patent.

Latest Patents

One of his key patents is titled "Light emitting device having first and second electrodes on one side of a light emitting structure." This invention presents a light-emitting device that enhances both surface and electrical properties. The device comprises a light-emitting structure that includes a first semiconductor layer, an active layer, and a second semiconductor layer. It features a first electrode connected to the first semiconductor layer and a second electrode connected to the second semiconductor layer. Additionally, the device incorporates an ohmic contact with multiple layers, including aluminum and gold, to improve its functionality.

Career Highlights

Sung Won David Roh is associated with LG Innotek Co., Ltd., where he continues to develop innovative technologies. His work has positioned him as a key figure in the advancement of light-emitting devices.

Collaborations

He has collaborated with notable colleagues, including Hyun Don Song and Ki Man Kang, contributing to the success of various projects within his field.

Conclusion

Sung Won David Roh's contributions to light-emitting technology exemplify his innovative spirit and dedication to advancing the industry. His patent reflects a significant step forward in enhancing device performance and functionality.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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