Sung-Wei Hung

Title: Innovations of Sung-Wei Hung in Thin Film Transistor Technology

Introduction

Sung-Wei Hung is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of thin film transistors, particularly through his innovative patent. His work is recognized for its potential applications in various electronic devices.

Latest Patents

Sung-Wei Hung holds a patent for a laminate structure of a thin film transistor. This invention includes a thin film transistor array and a passivation layer. The thin film transistor array consists of a gate, a channel layer formed on the gate, a gate insulating layer situated between the gate and the channel layer, and a source and a drain positioned on both sides of the channel layer. The passivation layer is formed on the thin film transistor array and features at least one contact hole that exposes the source or the drain. Notably, the passivation layer is made from an oxazole-containing photosensitive polyimide (PSPI) resin.

Career Highlights

Sung-Wei Hung is associated with Microcosm Technology Co., Ltd., where he continues to develop and refine his inventions. His work has garnered attention for its innovative approach to enhancing the performance and reliability of thin film transistors.

Collaborations

Sung-Wei collaborates with talented individuals such as Po-Tsun Liu and Bo-Hung Lai. Their combined expertise contributes to the advancement of technology in their field.

Conclusion

Sung-Wei Hung's contributions to thin film transistor technology exemplify the spirit of innovation. His patent reflects a significant advancement in the field, showcasing his dedication to improving electronic components.