Suwon-si, South Korea

Sung Hwan Park

This inventor holds 2 USPTO granted patents and 2 published patent applications. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sung Hwan Park. Retrieved from https://idiyas.com/inventor/sung-hwan-park-n3t43pec

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

Average Co-Inventor Count = 4.0


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: The Innovations of Sung Hwan Park

Introduction

Sung Hwan Park is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of semiconductor technology. His work primarily focuses on photosensitive polymers and their applications in photoresist compositions.

Latest Patents

Sung Hwan Park holds 1 patent for his invention titled "Photosensitive polymer, photoresist composition including the same, and method of fabricating semiconductor device." This patent involves an extreme ultraviolet (EUV) photosensitive polymer that includes a first repeating unit represented by Chemical Formula 1. This innovation is crucial for advancing semiconductor manufacturing processes.

Career Highlights

Sung Hwan Park is currently employed at Samsung Electronics Ltd., a leading company in the technology sector. His role involves research and development in semiconductor materials, where he applies his expertise to enhance product performance and efficiency.

Collaborations

Throughout his career, Sung Hwan Park has collaborated with talented individuals such as Juhyeon Park and Hyunwoo Kim. These collaborations have fostered innovation and contributed to the success of various projects within the semiconductor field.

Conclusion

Sung Hwan Park's contributions to semiconductor technology through his innovative patents and collaborations highlight his importance in the industry. His work continues to influence advancements in semiconductor manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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