The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2026
Filed:
Jan. 13, 2023
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, KR;
Inventors:
Sung Hwan Park, Suwon-si, KR;
Juhyeon Park, Hwaseong-si, KR;
Hyunwoo Kim, Seoul, KR;
Suk Koo Hong, Suwon-si, KR;
Assignee:
Samsung Electronics Co., Ltd., Suwon-si, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/004 (2006.01); G03F 7/038 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0397 (2013.01); G03F 7/004 (2013.01); G03F 7/0382 (2013.01); G03F 7/0392 (2013.01); C08F 2800/10 (2013.01);
Abstract
An extreme ultraviolet (EUV) photosensitive polymer includes a first repeating unit represented by Chemical Formula 1.
Park, Sung. (2026). Photosensitive polymer, photoresist composition including the same, and method of fabricating semiconductor device (U.S. Patent No. 12613467). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12613467
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile