Cheongju, South Korea

Sung Gu Lee

This inventor holds 1 USPTO granted patent. Top assignee: Korloy Inc.. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sung Gu Lee. Retrieved from https://idiyas.com/inventor/sung-gu-lee-c1b8btvs

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Innovations of Sung Gu Lee in Material Processing

Introduction

Sung Gu Lee is a notable inventor based in Cheongju-si, South Korea. He has made significant contributions to the field of material processing, particularly with his innovative patent related to alpha alumina thin films.

Latest Patents

Sung Gu Lee holds a patent for an alpha alumina thin film designed for processing difficult-to-cut materials and cast iron. This patent, which is a crucial advancement in the field, discloses an alpha alumina (α-Al2O3) thin film that consists of a lower layer formed on a base material made from cemented carbide. The α-Al2O3 thin film layer is formed on this lower layer, and it is divided into three distinct layers based on thickness, with specific grain size ratios that enhance its performance.

Career Highlights

Sung Gu Lee is currently employed at Korloy Inc., where he continues to innovate and develop new materials for various applications. His work has been instrumental in advancing the capabilities of cutting tools and materials used in manufacturing.

Collaborations

He has collaborated with notable colleagues, including Jae Hoon Kang and Dong Youl Lee, who have contributed to his research and development efforts.

Conclusion

Sung Gu Lee's contributions to material processing through his innovative patent demonstrate his expertise and commitment to advancing technology in this field. His work at Korloy Inc. continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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