Hwaseong-si, South Korea

Sung Duk Son

USPTO Granted Patents = 5 

Average Co-Inventor Count = 3.5

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Hwaseong-si, KR (2014)
  • Gyeonggi-do, KR (2023 - 2024)

Company Filing History:


Years Active: 2014-2025

Loading Chart...
5 patents (USPTO):

I specialize in innovations, inventions, inventors, patent attorneys, assignees and patents.

Title: Innovator Spotlight: Sung Duk Son

Introduction: Sung Duk Son, a brilliant inventor based in Hwaseong-si, South Korea, has made significant contributions to the field of technology with his innovative ideas and patented creations.

Latest Patents: Sung Duk Son's latest patents include a cutting-edge "Cleaning method and film forming apparatus" designed to optimize the cleaning process of a film forming apparatus by controlling different types of films and improving surface states. He also pioneered the "Gas introduction structure, thermal processing apparatus and gas supply method" that enhances the supply of processing gas into a vertically-elongated processing container, showcasing his prowess in creating efficient technological solutions.

Career Highlights: Sung Duk Son is affiliated with Tokyo Electron Limited, a prominent technology company known for its advancements in the semiconductor manufacturing industry. His remarkable career is highlighted by his three patented inventions, demonstrating his expertise in cutting-edge technology and problem-solving capabilities.

Collaborations: During his tenure, Sung Duk Son has collaborated with esteemed coworkers such as Shingo Hishiya and Keisuke Suzuki. Their teamwork and shared dedication to innovation have further propelled the success of their projects and inventions.

Conclusion: Sung Duk Son's inventive spirit and dedication to technological advancement have solidified his position as a respected innovator in the industry. His patented creations continue to make a positive impact in the field of technology, paving the way for future innovations and advancements.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…