Ichon, South Korea

Sung-Chan Park

This inventor holds 2 USPTO granted patents. Top assignees: Hynix Semiconductor Inc., Hyundai Electronics Industries Co. Ltd.. Active years: 2002-2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sung-Chan Park. Retrieved from https://idiyas.com/inventor/sung-chan-park-1dcneg3o

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

Average Co-Inventor Count = 2.4

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2002-2006

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2 patents (USPTO):Explore Patents

Title: Innovations of Sung-Chan Park in Semiconductor Technology

Introduction

Sung-Chan Park is a notable inventor based in Ichon-shi, South Korea. He has made significant contributions to the field of semiconductor technology, holding 2 patents that focus on improving the manufacturing processes of semiconductor devices. His work has been instrumental in enhancing the efficiency and reliability of electronic components.

Latest Patents

One of his latest patents is titled "Method for forming contact hole and spacer of semiconductor device." This patent discloses a contact hole forming method capable of reducing parasitic capacitance between conductive layer patterns. It also prevents bad contacts caused by mask misalignment and effectively fills an interlayer insulating layer between the conductive layer patterns. The method includes forming multiple conductive layer patterns on a substrate, creating an interlayer insulating layer on the completed structure, exposing a conductive layer pattern adjacent to the contact region, and forming an insulating spacer on the sidewall of the exposed conductive layer pattern.

Another significant patent is "Method for manufacturing contact hole in semiconductor device." This method outlines the steps for preparing an active matrix with a substrate and word lines, forming an etching barrier layer, and creating a photoresist pattern to define a contact hole. The process involves etching the interlayer insulating layer under varying conditions to expose the etching barrier layer, ensuring precision in the manufacturing of semiconductor devices.

Career Highlights

Sung-Chan Park has worked with prominent companies in the semiconductor industry, including Hyundai Electronics Industries Co., Ltd. and Hynix Semiconductor Inc. His experience in these organizations has allowed him to develop innovative solutions that address critical challenges in semiconductor manufacturing.

Collaborations

Throughout his career, Park has collaborated with talented individuals such as Jun-Dong Kim and Phil-Goo Kong. These partnerships have contributed to the advancement of semiconductor technologies and the successful implementation of his patented methods.

Conclusion

Sung-Chan Park's contributions to semiconductor technology through his innovative patents demonstrate his expertise and commitment to advancing the field. His work continues to influence the development of more efficient and reliable semiconductor devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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