Hwaseong, South Korea

Sung Baek Kim

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sung Baek Kim. Retrieved from https://idiyas.com/inventor/sung-baek-kim

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 10.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2021

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Innovations by Sung Baek Kim

Introduction

Sung Baek Kim is a notable inventor based in Hwaseong, South Korea. He has made significant contributions to the field of substrate treatment technology. His innovative approach has led to the development of a unique removal apparatus designed to enhance efficiency in gas removal processes.

Latest Patents

One of his key patents is titled "Removal apparatus for removing residual gas and substrate treating facility including the same." This invention focuses on a removal apparatus that effectively eliminates residual gases. The apparatus comprises a housing, a gas supply for introducing a non-reactive gas, a supporting member for the substrate, a heat radiating member, and a heating unit that provides heat to the supporting member.

Career Highlights

Sung Baek Kim is currently employed at Samsung Electronics Co., Ltd., a leading technology company known for its innovative products and solutions. His work at Samsung has allowed him to contribute to advancements in substrate treatment technologies.

Collaborations

He has collaborated with talented coworkers, including Dongil Yoon and Se Un Park, who share a commitment to innovation and excellence in their respective fields.

Conclusion

Sung Baek Kim's contributions to the field of substrate treatment through his innovative patent demonstrate his expertise and commitment to advancing technology. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…