The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 2021
Filed:
Dec. 30, 2017
Samsung Electronics Co., Ltd., Suwon-si, KR;
Cymechs Inc., Hwaseong-si, KR;
Heokjae Lee, Suwon-si, KR;
Hahn Park, Seoul, KR;
Jae Boo Kim, Seongnam-si, KR;
Dongil Yoon, Anyang-si, KR;
MinYoung Hwang, Suwon-si, KR;
Se Un Park, Hwaseong-si, KR;
Kang-Min Park, Hwaseong-si, KR;
Yongjoon Hong, Yongin-si, KR;
Sung Baek Kim, Hwaseong-si, KR;
Woo Jin Park, Hwaseong-si, KR;
Abstract
A removal apparatus for removing residual gases and a substrate treating facility for removing residual gases is disclosed. The residual gas removal apparatus includes a housing, a gas supply for providing a non-reactive gas into the housing, a supporting member provided to support a substrate and positioned in the housing, a heat radiating member spaced apart from the supporting member and positioned in the housing, and a heating unit for providing heat toward the supporting member and positioned between the heat radiating member and the supporting member.