Sun Jae Hwang

Sun Jae Hwang is a notable inventor based in Dobong-gu, South Korea. He has made significant contributions to the field of image sensors, holding a total of 3 patents. His work focuses on enhancing the functionality and manufacturing processes of image sensors, which are crucial components in various electronic devices.

Latest Patents

Hwang's latest patents include innovative designs and methods for manufacturing image sensors. One of his patents discloses an image sensor that features an isolation trench formed in a semiconductor substrate corresponding to a logic region. This design includes a pixel separating trench with a shallower depth than the isolation trench, along with a barrier region and a pixel separator. The configuration aims to improve the performance and efficiency of the image sensor.

Another patent presents an image sensor that incorporates a microlens aligned directly above the active area of a substrate. This design ensures that the microlens is positioned correctly to enhance image quality. The active region consists of photodiodes, and the alignment of the microlens with the active area is achieved through specific alignment keys. This innovation aims to optimize the sensor's performance by avoiding interference from metal lines.

Career Highlights

Sun Jae Hwang is currently associated with Dongbu Hitek Co., Ltd., a company known for its advancements in semiconductor technology. His role at the company allows him to contribute to cutting-edge research and development in the field of image sensors.

Conclusion

Sun Jae Hwang's contributions to the field of image sensors through his patents reflect his innovative spirit and dedication to advancing technology. His work continues to influence the development of high-performance imaging solutions.