This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2020.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2020
Title: Sun Ik Heo: Innovator in Integrated Circuit Manufacturing
Introduction
Sun Ik Heo is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of integrated circuit manufacturing. His innovative approach has led to the development of a unique method that enhances the efficiency of integrated circuit production.
Latest Patents
Sun Ik Heo holds a patent for a "Method and system for manufacturing an integrated circuit in consideration of a local layout effect." This patent describes a method of manufacturing an integrated circuit (IC) that includes instances of standard cells. The process involves arranging a first instance and a second instance adjacent to the first instance. The second instance features a front-end layer pattern that corresponds to a context group of the first instance. This context group contains information about front-end layer patterns of instances that cause the same local layout effect (LLE) on the first instance.
Career Highlights
Sun Ik Heo is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in integrated circuit technology.
Collaborations
Sun Ik Heo has collaborated with notable colleagues, including Wootae Kim and Hyung-ock Kim. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.
Conclusion
Sun Ik Heo's contributions to integrated circuit manufacturing demonstrate his expertise and commitment to innovation. His patent reflects a significant advancement in the field, showcasing his ability to address complex challenges in technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
