The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 2020

Filed:

Jan. 11, 2018
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;

Inventors:

Wootae Kim, Seoul, KR;

Hyung-Ock Kim, Seoul, KR;

Jaehoon Kim, Seoul, KR;

Naya Ha, Seoul, KR;

Ki-Ok Kim, Seoul, KR;

Eunbyeol Kim, Daegu, KR;

Jung Yun Choi, Suwon-si, KR;

Sun Ik Heo, Hwaseong-si, KR;

Assignee:

SAMSUNG ELECTRONICS CO., LTD., Suwon-si, Gyeonggi-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G05B 19/4097 (2006.01);
U.S. Cl.
CPC ...
G05B 19/4097 (2013.01); G06F 17/5072 (2013.01); G05B 2219/45031 (2013.01); G06F 2217/12 (2013.01); Y02P 90/265 (2015.11);
Abstract

A method of manufacturing an integrated circuit (IC) including instances of standard cells includes arranging a first instance and arranging a second instance adjacent to the first instance. The second instance has a front-end layer pattern corresponding to a context group of the first instance. The context group includes information about front-end layer patterns of instances, the front-end layer patterns causing a same local layout effect (LLE) on the first instance and arranged adjacent to the first instance.


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