Jeonju, South Korea

Sun Hee Choy

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sun Hee Choy. Retrieved from https://idiyas.com/inventor/sun-hee-choy

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Sun Hee Choy: Semiconductor Manufacturing Inventor

Introduction

Sun Hee Choy is an inventor based in Jeonju, South Korea. His patent work concerns semiconductor manufacturing equipment and processes, and he is associated with Samsung Electronics Ltd.

Latest Patents

Choy is credited with 1 patent: “Substrate Treatment Apparatus and Semiconductor Device Manufacturing Method Using the Same.” The invention describes loading a substrate into a treatment apparatus, depositing material on it, and cleaning the apparatus. Its system includes a housing with a treatment area, a gas supply, a remote plasma supply, and a shower head. The gas supply delivers a first process gas at a flow rate of 1,000 to 15,000 sccm, as well as a second process gas. The remote plasma supply applies RF power to generate plasmas from both gases, which the shower head delivers to the treatment area. The second process plasma is used to clean membrane material deposited on the housing’s inner wall.

Career Highlights

Choy’s listed patent focuses on integrating deposition and equipment-cleaning steps into a semiconductor device manufacturing method. The apparatus design uses remote plasma and a shower head to deliver process plasmas to the treatment area.

Collaborations

The provided information identifies Woo Hyun Lee and Su Ji Gim as Choy’s coworkers. It does not specify their roles in the patent or the nature of their collaboration.

Conclusion

Sun Hee Choy’s patent describes a semiconductor treatment apparatus and manufacturing method that combine substrate deposition with plasma-based cleaning of the equipment.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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