Yokohama, Japan

Sumito Shimizu


Average Co-Inventor Count = 1.9

ph-index = 4

Forward Citations = 49(Granted Patents)


Location History:

  • Yokohama, JP (2000 - 2004)
  • Tokyo, JP (2004)
  • Kyoto, JP (2005)

Company Filing History:


Years Active: 2000-2005

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6 patents (USPTO):Explore Patents

Title: Sumito Shimizu: Innovator in Lithography Technology

Introduction

Sumito Shimizu is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of lithography, particularly in the development of advanced techniques for patterning reticle blanks. With a total of 6 patents to his name, Shimizu's work has had a profound impact on the semiconductor manufacturing industry.

Latest Patents

Shimizu's latest patents include innovative methods and apparatus for enhancing the resolution of lithography reticles. One notable patent focuses on "Apparatus and methods for patterning a reticle blank by electron-beam inscription with reduced exposure of the reticle blank by backscattered electrons." This invention addresses the challenge of backscattered particles that can degrade pattern resolution during the electron-beam inscription process. By minimizing the number of backscattered particles re-entering the reticle blank, Shimizu's methods significantly improve pattern resolution.

Another important patent is titled "Charged-particle-beam microlithography methods exhibiting reduced coulomb effects." This invention outlines techniques for performing charged-particle-beam microlithography while minimizing Coulomb effects that can distort pattern images. By optimizing the beam current reaching the substrate, Shimizu's methods enhance the precision of lithographic processes.

Career Highlights

Throughout his career, Sumito Shimizu has worked with leading companies in the industry, including Nikon Corporation. His expertise in lithography and patterning technologies has positioned him as a key figure in advancing semiconductor manufacturing techniques.

Collaborations

Shimizu has collaborated with notable professionals in the field, including Yoshijiro Ushio and Toru Nakamura. These collaborations have further enriched his work and contributed to the development of innovative lithography solutions.

Conclusion

Sumito Shimizu's contributions to lithography technology exemplify the spirit of innovation in the semiconductor industry. His patents and methods continue to influence the way patterns are inscribed on reticle blanks, paving the way for advancements in manufacturing processes.

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