The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 2005
Filed:
Jul. 18, 2001
Wakako Suganuma, Tokyo, JP;
Sumito Shimizu, Kyoto, JP;
Atsushi Yamada, Yokohama, JP;
Shohei Suzuki, Fukaya, JP;
Hajime Yamamoto, Kumagaya, JP;
Wakako Suganuma, Tokyo, JP;
Sumito Shimizu, Kyoto, JP;
Atsushi Yamada, Yokohama, JP;
Shohei Suzuki, Fukaya, JP;
Hajime Yamamoto, Kumagaya, JP;
Nikon Corporation, Tokyo, JP;
Abstract
Apparatus and methods are disclosed for inscribing a pattern on a reticle blank to produce a lithography reticle. As a reticle blank is inscribed using a charged particle beam (e.g., electron beam), some of the incident charged particles pass through the reticle blank and are backscattered from underlying structure (e.g., from a stage used to hold the reticle blank during inscription). These backscattered particles reduce the pattern resolution on the reticle. The present apparatus and methods reduce the number of backscattered particles re-entering the reticle blank, thereby improving pattern resolution.