Fuchu, Japan

Sumio Mori

This inventor holds 2 USPTO granted patents. Top assignees: Anelva Corporation, Nec Corporation. Active years: 1990-1991.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sumio Mori. Retrieved from https://idiyas.com/inventor/sumio-mori-c9uvw8dn

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 83(Granted Patents)


Company Filing History:


Years Active: 1990-1991

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2 patents (USPTO):Explore Patents

Title: Sumio Mori: Pioneer in Microwave Plasma Technology

Introduction

Sumio Mori, an innovative inventor based in Fuchu, Japan, has made significant contributions to the field of electronic device manufacturing. His expertise is particularly evident in microwave plasma technology, which has applications in various electronic devices, including transistors. With a total of two patents to his name, Mori's work demonstrates his commitment to advancing technological processes.

Latest Patents

Mori's latest patents focus on enhancing the efficiency and effectiveness of manufacturing electronic devices. One of his notable inventions is a **Microwave Plasma Etching Method and Apparatus**. This innovative method involves forming a stream of plasma from a processing gas within a designated plasma formation chamber. By utilizing an electric field produced by microwaves and the electron cyclotron resonance phenomenon generated by a perpendicular magnetic field, this method processes the substrate surface optimally. The apparatus includes key components such as a plasma formation chamber, a microwave introducing device, a magnetic field applying device, and a gas introducing system, ensuring precise control during the etching process.

Another significant patent is the **Microwave Plasma Treatment Apparatus**, which features a design comprising multiple auxiliary magnets arranged strategically around the plasma formation chamber. These magnets are disposed both circumferentially and axially, with reversed polarities that create a uniform high-density plasma environment throughout the chamber, enhancing the treatment of materials involved in electronic device production.

Career Highlights

Mori's career includes roles at prominent companies such as Anelva Corporation and NEC Corporation. His experience in these organizations has contributed to his deep understanding of microwave plasma technology and its practical applications in the electronics industry.

Collaborations

Throughout his career, Sumio Mori has collaborated with notable individuals, including his coworkers Masami Sasaki and Yasuhiro Suzuki. These partnerships have enriched his work, fostering an exchange of ideas and driving innovation in the field.

Conclusion

Sumio Mori stands out as an influential inventor in the realm of microwave plasma technology. His patents not only showcase his ingenuity but also have practical implications for the future of electronic device manufacturing. As technology continues to evolve, Mori's work is likely to remain pivotal in pushing the boundaries of what is possible in electronics.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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