Suk-Jong Bae

Title: Innovations of Suk-Jong Bae in Photomask Technology

Introduction

Suk-Jong Bae is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of photomask technology, holding a total of 4 patents. His work focuses on improving the design and manufacturing processes of photomasks, which are essential in the semiconductor manufacturing industry.

Latest Patents

Suk-Jong Bae's latest patents include a method of designing the layout of a photomask and a method of manufacturing a photomask. The method of designing a layout involves obtaining a design layout of a mask pattern, performing optical proximity correction on the design layout to obtain design data, and correcting position data of the pattern based on position error data. This process ensures that the exposure device can accurately expose an exposure beam according to the corrected design data. Additionally, he has developed methods to correct photomask registration errors, which include forming an optical pattern on a photomask substrate and measuring the registration errors to enhance the accuracy of photomask production.

Career Highlights

Suk-Jong Bae is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate in the field of photomask technology. His expertise and contributions have positioned him as a key figure in advancing semiconductor manufacturing processes.

Collaborations

He has collaborated with notable coworkers, including Myoung-soo Lee and Jung-Hoon Lee, who have also contributed to the advancements in photomask technology.

Conclusion

Suk-Jong Bae's innovative work in photomask technology has led to significant advancements in the semiconductor industry. His patents reflect a commitment to improving manufacturing processes and ensuring precision in photomask design.