The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 2010
Filed:
Nov. 01, 2006
Myoung-soo Lee, Suwon-si, KR;
Suk-jong Bae, Seoul, KR;
Jung-hoon Lee, Yongin-si, KR;
Seong-woo Choi, Suwon-si, KR;
Byung-gook Kim, Seoul, KR;
Myoung-Soo Lee, Suwon-si, KR;
Suk-Jong Bae, Seoul, KR;
Jung-Hoon Lee, Yongin-si, KR;
Seong-Woo Choi, Suwon-si, KR;
Byung-Gook Kim, Seoul, KR;
Samsung Electronics Co., Ltd., Suwon-Si, KR;
Abstract
Provided are photomask registration errors of which have been corrected and a method of correcting the registration errors of a photomask. The photomask includes a photomask substrate, an optical pattern formed on one surface of the photomask substrate, and a plurality of stress generation portions formed in the photomask substrate. A method of correcting the registration errors of a photomask includes the steps of forming an optical pattern on a photomask substrate, measuring the registration errors of the optical pattern, and forming a plurality of stress generation portions in the photomask substrate so that the stress generation portions correspond to the measured registration errors.