Suwon, South Korea

Suk-Fill Yun

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Suk-Fill Yun. Retrieved from https://idiyas.com/inventor/suk-fill-yun

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Suk-Fill Yun: Innovator in Semiconductor Device Fabrication

Introduction

Suk-Fill Yun is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of semiconductor device fabrication. His innovative work has led to the development of a specialized apparatus that enhances the efficiency of photo-resist dispensing.

Latest Patents

Suk-Fill Yun holds a patent for an "Apparatus for dispensing photo-resist in semiconductor device fabrication equipment." This apparatus includes a tank designed to hold a photo-resist solution, a pump unit for transferring the solution, and a filter unit to ensure the solution's purity. Additionally, it features gas discharge units that effectively remove gas bubbles from the photo-resist solution, both in the tank and the filter.

Career Highlights

Suk-Fill Yun is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to focus on advancing semiconductor technologies, which are crucial for modern electronic devices.

Collaborations

Suk-Fill Yun collaborates with Jin-Jun Park, a talented female engineer who contributes to their joint projects. Their teamwork exemplifies the importance of collaboration in driving innovation within the semiconductor industry.

Conclusion

Suk-Fill Yun's contributions to semiconductor device fabrication through his patented inventions highlight his role as a key innovator in the field. His work continues to influence advancements in technology and manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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