Seoul, South Korea

Sueun Chung

This inventor holds 2 USPTO granted patents and 2 published patent applications and 2 EPO patents. Top assignee: Snu Rdb Foundation. Active years: 2016-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sueun Chung. Retrieved from https://idiyas.com/inventor/sueun-chung-l45wpall

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 100.0

 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2016-2018

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2 patents (USPTO):Explore Patents

Title: Innovations of Inventor Sueun Chung

Introduction

Sueun Chung is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of lithography systems, holding a total of 2 patents. His work focuses on enhancing image processing techniques to improve coating methods for target objects.

Latest Patents

One of Sueun Chung's latest patents is an image processing-based lithography system and method of coating a target object. This innovative technique involves a lithography system that includes at least one target object placed on a substrate. The system features a processor designed to process images of the target object, determining an optical pattern for a coating layer. Additionally, an exposure apparatus is utilized to provide light with the optical pattern determined by the processor to the substrate.

Career Highlights

Sueun Chung is currently associated with the Snur & Db Foundation, where he continues to develop and refine his innovative technologies. His work has garnered attention for its potential applications in various industries, particularly in manufacturing and materials science.

Collaborations

Some of his coworkers include Seungah Lee and Jisung Jang, who contribute to the collaborative efforts within the Snur & Db Foundation.

Conclusion

Sueun Chung's contributions to the field of lithography systems exemplify the impact of innovative thinking in technology. His patents reflect a commitment to advancing image processing techniques, which can lead to significant improvements in manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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