The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2016
Filed:
Mar. 29, 2012
Applicants:
Sung Hoon Kwon, Seoul, KR;
Sueun Chung, Seoul, KR;
Seungah Lee, Gyeonggi-do, KR;
Jisung Jang, Seoul, KR;
Sangkwon Han, Incheon, KR;
Inventors:
Sung Hoon Kwon, Seoul, KR;
Sueun Chung, Seoul, KR;
Seungah Lee, Gyeonggi-do, KR;
Jisung Jang, Seoul, KR;
Sangkwon Han, Incheon, KR;
Assignee:
SNU R&DB FOUNDATION, Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01); G03F 7/20 (2006.01); G03F 9/00 (2006.01); H01L 21/56 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70291 (2013.01); G03F 7/2057 (2013.01); G03F 7/705 (2013.01); G03F 7/7085 (2013.01); G03F 7/70466 (2013.01); G03F 7/70483 (2013.01); G03F 7/70525 (2013.01); G03F 7/70625 (2013.01); G03F 9/00 (2013.01); H01L 21/561 (2013.01);
Abstract
A technique related with a lithography system is disclosed. The lithography system includes at least one target object disposed on a substrate, a processor configured to process an image of the target object to determine an optical pattern for a coating layer of the target object, and an exposure apparatus configured to provide light having the optical pattern determined by the processor to the substrate.