Hwaseong-si, South Korea

Sue-ryeon Kim

USPTO Granted Patents = 6 

Average Co-Inventor Count = 4.8

ph-index = 2

Forward Citations = 9(Granted Patents)


Location History:

  • Kyungki-do, KR (1999 - 2002)
  • Hwaseong-si, KR (2017 - 2021)

Company Filing History:


Years Active: 1999-2021

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6 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Sue-ryeon Kim

Introduction

Sue-ryeon Kim is a prominent inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of six patents. His work focuses on developing compositions and methods that enhance the efficiency of semiconductor manufacturing processes.

Latest Patents

One of Sue-ryeon Kim's latest patents is titled "Composition for removing silicone resins and method of thinning substrate by using the same." This invention provides compositions that effectively remove silicone resins, which are often problematic during semiconductor substrate processing. The compositions include a heterocyclic solvent and an alkyl ammonium fluoride salt, which significantly improve the decomposition rate of silicone resins. Another notable patent is related to a semiconductor wafer design, which includes a main body with specific bevel regions that enhance the manufacturing process and structural integrity of semiconductor devices.

Career Highlights

Throughout his career, Sue-ryeon Kim has worked with leading companies in the technology sector, including Samsung Electronics and Dongwoo Fine-chem. His experience in these organizations has allowed him to develop innovative solutions that address complex challenges in semiconductor manufacturing.

Collaborations

Sue-ryeon Kim has collaborated with notable colleagues such as Chang-su Lim and Hyeog-Ki Kim. These partnerships have contributed to the advancement of technology in the semiconductor industry.

Conclusion

Sue-ryeon Kim's innovative work and patents have made a significant impact on semiconductor technology. His contributions continue to influence the industry and pave the way for future advancements.

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