Tokyo, Japan

Subei Shun

This inventor holds 1 USPTO granted patent. Top assignee: Sanan Japan Technology Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Subei Shun. Retrieved from https://idiyas.com/inventor/subei-shun-2wi3op0y

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Subei Shun: Inventor of an Acoustic Wave Device Manufacturing Method.

Introduction

Subei Shun is an inventor based in Tokyo, Japan, associated with Sanan Japan Technology Corporation. His patent work concerns materials and manufacturing processes for acoustic wave devices.

Latest Patents

Shun is associated with 1 patent, titled “Acoustic Wave Device and Method for Producing Same.” The invention describes a method that begins by polishing a sapphire substrate and placing a magnesium oxide substrate or magnesium oxide powder on its main surface. Heat treatment forms a polycrystalline spinel layer, after which the magnesium oxide is removed and the spinel layer is polished. A piezoelectric substrate is then formed on the spinel layer. The specified heat treatment takes place at 1300°C to 1600°C for 0.1 to 48 hours.

Career Highlights

Shun’s listed patent highlights his work on producing layered substrates for acoustic wave devices. The process focuses on forming and preparing a polycrystalline spinel layer on sapphire before adding a piezoelectric substrate.

Collaborations

Shun is associated with Sanan Japan Technology Corporation. His listed coworker is Shinichi Shioi.

Conclusion

Subei Shun’s patent describes a manufacturing approach that combines sapphire, a polycrystalline spinel layer, and a piezoelectric substrate to produce an acoustic wave device.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…