Company Filing History:
Years Active: 2002
Title: Innovations of Inventor Su-Yu Lu
Introduction
Su-Yu Lu is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of methods to improve NMOS devices. With a total of 2 patents, his work focuses on enhancing device performance and reducing short channel effects.
Latest Patents
One of Su-Yu Lu's latest patents is titled "Formation of an indium retrograde profile via antimony ion implantation to improve NMOS short channel effect." This invention describes a method for forming a pocket implant region that reduces short channel effects for narrow channel length NMOS devices. The process involves the use of antimony ions to limit the broadening of the indium pocket implant profile during anneal procedures. This innovation aims to enhance the performance of NMOS transfer gate transistors.
Another significant patent is "Method of forming an indium retrograde profile via use of a low temperature anneal procedure to reduce NMOS short channel effects." This method also focuses on creating an implanted pocket region to mitigate short channel effects in NMOS devices. By utilizing a low temperature anneal procedure, the final indium profile remains stable even after high-temperature processes, resulting in improved device characteristics.
Career Highlights
Su-Yu Lu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to advance semiconductor technology. His expertise in the field has led to innovative solutions that address critical challenges in device fabrication.
Collaborations
Su-Yu Lu has collaborated with several talented individuals, including Chih-Hao Wang and Mu-Chi Chiang. These collaborations have fostered a productive environment for innovation and development in semiconductor technologies.
Conclusion
Su-Yu Lu's contributions to the field of semiconductor technology through his patents and collaborations highlight his role as a key innovator. His work continues to influence the advancement of NMOS devices, showcasing the importance of innovation in technology.