Hsinchu, Taiwan

Su-Chen Lin

This inventor holds 1 USPTO granted patent. Top assignee: Vanguard International Semiconductor Corporation. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Su-Chen Lin. Retrieved from https://idiyas.com/inventor/su-chen-lin-ns0pmsz0

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 9.0

ph-index = 1


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: The Innovations of Su-Chen Lin

Introduction

Su-Chen Lin is a notable inventor based in Hsinchu, Taiwan. She has made significant contributions to the field of semiconductor technology. Her innovative work has led to the development of a unique method for manufacturing contact plugs.

Latest Patents

Su-Chen Lin holds a patent for a "Contact plug and method for manufacturing the same." This patent describes a method that includes providing a silicon substrate with at least one opening. A titanium layer is conformably formed in the opening, followed by the formation of a first barrier layer on the titanium layer. A rapid thermal process is then performed on both the titanium layer and the first barrier layer. After this process, a second barrier layer is conformably formed on the first barrier layer within the opening.

Career Highlights

Su-Chen Lin is currently employed at Vanguard International Semiconductor Corporation. Her work at this company has been instrumental in advancing semiconductor manufacturing techniques. She has demonstrated a strong commitment to innovation and excellence in her field.

Collaborations

Su-Chen Lin has collaborated with talented coworkers, including Yi-Tsung Jan and Peng-Fei Wu. These collaborations have further enhanced her research and development efforts.

Conclusion

Su-Chen Lin's contributions to semiconductor technology through her innovative patent demonstrate her expertise and dedication to the field. Her work continues to influence advancements in manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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