O'Fallon, MO, United States of America

Stuart J McNaught

This inventor holds 1 USPTO granted patent. Top assignee: University of Central Florida Research Foundation Inc.. Active years: 2005.


Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Stuart J McNaught

Introduction

Stuart J McNaught is a notable inventor based in O'Fallon, MO (US). He has made significant contributions to the field of extreme ultraviolet (EUV) radiation sources. His work focuses on enhancing the efficiency and effectiveness of laser-produced plasma light sources.

Latest Patents

Stuart J McNaught holds a patent for a "Laser-produced plasma EUV light source with isolated plasma." This innovative EUV radiation source includes a nozzle positioned at a sufficient distance from a target region. This design ensures that the EUV radiation generated by a laser beam impinging on a target stream is not significantly absorbed by the target vapor near the nozzle. Additionally, the configuration prevents significant erosion of the nozzle and contamination of source optics. In one embodiment, the nozzle is more than 10 cm away from the target region. He has 1 patent to his name.

Career Highlights

Stuart J McNaught is associated with the University of Central Florida Research Foundation Inc. His work has contributed to advancements in the field of EUV technology, which is crucial for various applications, including semiconductor manufacturing.

Collaborations

Stuart has collaborated with notable colleagues such as Jeffrey S Hartlove and Henry Shields. Their combined expertise has furthered research and development in their respective fields.

Conclusion

Stuart J McNaught's innovative work in laser-produced plasma EUV light sources showcases his commitment to advancing technology. His contributions are significant in the realm of EUV radiation, and his collaborations with esteemed colleagues enhance the impact of his research.

Profile summary based on public USPTO records.
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