The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2005
Filed:
Jun. 26, 2003
Jeffrey S. Hartlove, Rolling Hills Estates, CA (US);
Mark E. Michaelian, Lomita, CA (US);
Henry Shields, San Pedro, CA (US);
Steven W. Fornaca, Torrance, CA (US);
Stuart J. Mcnaught, O'Fallon, MO (US);
Fernando Martos, Creve Coeur, MO (US);
Richard H. Moyer, Chesterfield, MO (US);
Jeffrey S. Hartlove, Rolling Hills Estates, CA (US);
Mark E. Michaelian, Lomita, CA (US);
Henry Shields, San Pedro, CA (US);
Steven W. Fornaca, Torrance, CA (US);
Stuart J. McNaught, O'Fallon, MO (US);
Fernando Martos, Creve Coeur, MO (US);
Richard H. Moyer, Chesterfield, MO (US);
University of Central Florida Research Foundation, Orlando, FL (US);
Abstract
An EUV radiation source () that includes a nozzle () positioned a far enough distance away from a target region () so that EUV radiation () generated at the target region () by a laser beam () impinging a target stream () emitted from the nozzle () is not significantly absorbed by target vapor proximate the nozzle (). Also, the EUV radiation () does not significantly erode the nozzle () and contaminate source optics (). In one embodiment, the nozzle () is more than 10 cm away from the target region ().