Merignac, France

Stéphane Goujard


 

Average Co-Inventor Count = 3.7

ph-index = 4

Forward Citations = 55(Granted Patents)


Location History:

  • Erignac, FR (2012 - 2013)
  • Merignac, FR (2007 - 2019)
  • Moissy-Cramayel, FR (2021)

Company Filing History:


Years Active: 2007-2021

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8 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Stéphane Goujard

Introduction

Stéphane Goujard is a notable inventor based in Merignac, France. He has made significant contributions to the field of chemical vapor infiltration and deposition, holding a total of 8 patents. His work has advanced the technology used in various industrial applications.

Latest Patents

One of his latest patents is a method of chemical vapor infiltration or deposition. This method involves forming silicon carbide in the pores of a porous substrate or on the surface of a substrate placed in a reaction enclosure. The silicon carbide is formed from a gas phase introduced into the reaction enclosure, which includes a reagent compound that serves as a precursor of silicon carbide. The gas phase has specific ratios of carbon to silicon atoms, enhancing the efficiency of the process.

Another significant patent is for shaping equipment and facilities for gas-phase chemical infiltration of fibrous preforms. This shaping tooling includes a structural enclosure formed by supports with multiply-perforated zones. Each support has an uncased zone that includes the multiply-perforated zone, allowing for effective chemical vapor infiltration of fiber preforms.

Career Highlights

Stéphane has worked with prominent companies in the aerospace and ceramics industries, including Snecma Propulsion Solide and Safran Ceramics. His experience in these organizations has contributed to his expertise in developing innovative technologies.

Collaborations

Throughout his career, Stéphane has collaborated with talented professionals such as Sébastien Bertrand and Franck Lamouroux. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Stéphane Goujard's contributions to the field of chemical vapor infiltration and deposition demonstrate his innovative spirit and dedication to advancing technology. His patents and collaborations reflect a commitment to excellence in his work.

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