The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2007
Filed:
Mar. 06, 2002
Stéphane Goujard, Merignac, FR;
Bruno Bernard, Pessac, FR;
Jean-philippe Richard, Le Taillan Medoc, FR;
Stéphane Goujard, Merignac, FR;
Bruno Bernard, Pessac, FR;
Jean-Philippe Richard, Le Taillan Medoc, FR;
Snecma Propulsion Solide, Le Haillan, FR;
Abstract
Annular substrates () are stacked in an enclosure where they define an inside volume () and an outer volume () outside the stack. A gas containing at least one precursor of a matrix material to be deposited within the pores of the substrates is channeled inside the enclosure to a first one () of the two volumes, and a residual gas is extracted from the enclosure from the other one () of the volumes. One or more leakage passages () allow the volumes to communicate with each other, other than through the substrates. The total section of the leakage passages has a value lying between a minimum value for ensuring that a maximum gas pressure in the first volume is not exceeded until the end of densification, and a maximum value such that a pressure difference is indeed established between the two volumes from the beginning of densification.