This inventor holds 1 USPTO granted patent. Top assignee: Merck + Co., Inc.. Active years: 2008.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2008
Title: Innovations of Steven M Arrivo in Particle Size Monitoring
Introduction
Steven M Arrivo is an accomplished inventor based in Ann Arbor, MI (US). He has made significant contributions to the field of particle size monitoring through his innovative methodologies. His work is particularly relevant in industries where precise control of particle size is crucial.
Latest Patents
One of Steven M Arrivo's notable patents is titled "Method for monitoring particle size." This invention provides methods for using visible and/or near-infrared spectroscopic methodology to monitor and control processes for the generation of particles. The patent emphasizes the ability to reduce or increase particle size effectively. A key embodiment of this invention employs visible and/or near-infrared diffuse reflectance spectroscopy to monitor particle size, making it especially useful for optically dense samples. This method allows for on-line monitoring of particle size, which is a significant advancement over existing techniques.
Career Highlights
Steven M Arrivo is associated with Merck & Co., Inc., where he applies his expertise in particle size monitoring. His work has been instrumental in enhancing the efficiency and accuracy of particle generation processes. With a focus on innovation, he continues to contribute to advancements in this critical area of research.
Collaborations
Throughout his career, Steven has collaborated with notable colleagues, including William E Bowen and Robert A Reed. These collaborations have further enriched his research and development efforts, leading to impactful innovations in the field.
Conclusion
Steven M Arrivo's contributions to particle size monitoring exemplify the importance of innovation in scientific research. His patented methods provide valuable tools for industries that rely on precise particle control. His work continues to influence advancements in this area, showcasing the significance of his inventions.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
