Company Filing History:
Years Active: 2001
Title: **Inventor Spotlight: Steven Labovitz**
Introduction
Steven Labovitz, an innovative inventor based in Santa Clara, California, has made significant contributions to the field of photomask technology. With a unique approach to enhancing peripheral critical dimensions, he has developed a patent that showcases his expertise and ingenuity.
Latest Patents
Among his notable achievements, Steven holds a patent titled "Modulation of peripheral critical dimension on photomask with differential electron beam dose." This method involves depositing a resist layer on a mask substrate with both transparent and opaque layers. The resist is then exposed to radiation, enabling the production of intricate features within an active device area, alongside a moat that surrounds it. By intentionally applying a higher exposure dose in the moat compared to the active device area, Steven's technique leads to enhanced precision in photomask applications. The additional exposure dose is empirically derived, taking into account factors like the type and thickness of the resist.
Career Highlights
Steven Labovitz is currently affiliated with Intel Corporation, a leading technology company known for its innovative developments in computer processors and other electronics. His role within the organization underlines his significant involvement in groundbreaking technological advancements.
Collaborations
Throughout his career, Steven has collaborated with fellow experts, including Fred T. Chen and Wilman Tsai. Working alongside these talented professionals has contributed to fostering a dynamic environment for creativity and innovation in their respective fields.
Conclusion
Steven Labovitz's contributions to the field of photomask technology reflect his profound understanding of the nuances involved in electronic device fabrication. His patent not only demonstrates his innovative spirit but also holds the potential to impact the industry positively. As an inventor, Steven continues to pave the way for future developments in technology, making his mark on the ever-evolving landscape of innovations.