Company Filing History:
Years Active: 2003
Title: Innovations of Steven J Remis
Introduction
Steven J Remis is an accomplished inventor based in Sunnyvale, CA. He has made significant contributions to the field of substrate handling systems. His innovative work has led to the development of a unique patent that enhances the efficiency of substrate processing chambers.
Latest Patents
One of Steven J Remis's notable patents is titled "Apparatus and method for using a robot to remove a substrate carrier door." This patent describes a substrate handling system that includes an integrated door removal assembly for an environmentally controlled substrate processing chamber. The system features a robot positioned within the chamber, equipped with a drive mechanism connected to the robot. A door interface mechanism is attached to the drive mechanism, which includes a door key and a door key control assembly. The drive mechanism provides mechanical control of the door key control assembly, allowing the door key to manipulate the coupling of a substrate carrier door to a port door. The coupled doors can be stored within the chamber or on the robot. Additionally, the drive mechanism may include a substrate end effector, enabling the robot to transport substrates within the chamber. The robot is designed to move within the chamber to multiple processing stations. This patent showcases his innovative approach to improving substrate handling processes.
Career Highlights
Steven J Remis is currently employed at Pri Automation, Inc., where he continues to develop cutting-edge technologies in the field of automation and substrate processing. His work at Pri Automation has allowed him to collaborate with other talented professionals in the industry.
Collaborations
One of his notable coworkers is Craig Chidlow, with whom he has likely shared insights and expertise in their respective fields.
Conclusion
Steven J Remis is a prominent inventor whose work has significantly impacted substrate handling systems. His innovative patent demonstrates his commitment to advancing technology in this area. His contributions continue to shape the future of substrate processing.